MPCVD (microwave plasma chemical vapor deposition) is an advanced, high-performance system for synthesizing artificial diamond. CSMH’s self-developed MPCVD equipment enables high-quality growth of both single-crystal and polycrystalline diamond. The system supports microwave output frequencies ranging from 915 to 2450 MHz and can grow diamond films with sizes from 2-inch to 10-inch.
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Precision integrated equipment design
Highly stable process output
Long-term reliable operation
Fully automated intelligent control system
Functional requirements：
★ (1) The microwave source generates high-frequency microwave and enters the reaction cavity through waveguide to stimulate high-purity hydrogen to produce plasma, and the carbon element in methane gas is deposited onto the diamond wafer of the growth stage to complete the semiconductor single crystal diamond epitaxy by controlling the temperature and pressure in the cavity.
★ (2) The waveguide system is metal waveguide (including pins regulator, waveguide, etc.), the reaction chamber is double water-cooled stainless steel reaction chamber, and the substrate stage is elevated water-cooled substrate stage.
★(3) Equipped with rotary vacuum oil-free pump, turbo molecular pump, and high vacuum gauge, which can display the vacuum degree of the reaction chamber.
★ (4) with high-precision flow meter and flow control valve, each gas has the ability to blow bypass, through the blowing to realize the pipeline self-cleaning, to ensure the purity of the subsequent gas ability.
★ (5) with infrared temperature measurement system, can display the abutment, sample temperature.
★ (6) The standard substrate tray is molybdenum disk, which can realize one time growth and many times continuous growth of diamond samples, and can observe the reaction chamber samples from four directions.
★ (7) with a water chiller, can use the cooling water system on the system's reaction chamber, abutment, microwave power supply and other components of the cooling to ensure that the equipment works properly.
★ (8) with system software, with LCD touch screen, PLC automatic control system, can be deposited on the process of program control, with an insurance device, alarm unit and emergency shutdown function, with remote fault alarm function.
Product Specifications
Effective Deposition Area：2-inch, 3-inch, 4-inch, 6-inch, 8-inch, 10-inch
Microwave Frequency：915~2450MHz
Maximum Microwave Power：6 kW, 10 kW, 15 kW, 75 kW, etc.
Molybdenum Substrate Plate：Compatible with 2inch/3inch/4inch/6inch/8inch/10inch
Vacuum Leak Rate：≤5×10⁻¹⁰ Pa·m/s (He)
Gas Delivery System：Standard five channels, expandable to six channels
Pressure Holding Capability：Better than 1 Pa @ 12 h
Microwave Source：Optional domestic or imported microwave source
Optional Configuration：Molecular pump, bias voltage, infrared temperature measurement, etc.
Applications：Supports single crystal diamond and polycrystalline diamond growth
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